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Sete Orthopedic Implants
| Customization: | Available |
|---|---|
| After-sales Service: | Onlin |
| Warranty: | 1 |
CVD ALD Atomic Layer Deposition System is a high-precision single-wafer deposition system. It is specifically engineered for advanced scientific research and small-scale industrial experiments. This system is fully compliant with CE standards and is a cornerstone in fields like micro-electronics, nano-materials, and solar battery development.
| Parameter Item | Specifications |
|---|---|
| Wafer Dimension | 8 inch and below |
| Wafer Temperature | RT-400ºC, Controlling precision ±0.1ºC |
| Precursor Lines | Three precursor lines (Optional more) |
| Precursor Line Temp. | RT-200ºC, Controlling precision ±0.1ºC |
| Source Bottle Temp. | RT-200ºC, Controlling precision ±0.1ºC |
| ALD Valve Type | Swagelok ALD swift valve |
| Growing Mode | Consecutive or interval deposition mode |
| Power Supply | 50-60Hz, 220V/20A AC |
| Equipment Dimension | 600mm x 600mm x 1100mm |
Materials Capable of Deposition:
Primary Fields:







